Electrolyte for the galvanic deposition of low-stress, crack-res

Details Electrolyte for the galvanic deposition of low-stress, crack-res Electrolyte for the galvanic deposition of low-stress, crack-res

1998-09-23

2000-09-12

Mayekar, Kishor

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Depositing predominantly single metal coating

260259, 260257, 106 128, C25D 352

Patent

active

061173010

ABSTRACT:
An electrolyte for the galvanic deposition of stress-relieved, crack-resistant ruthenium layers containing ruthenium in complexed form. The additive for the electrolyte is pyridine or an N-alkylated pyridinium salts of formula I ##STR1## wherein R.sup..crclbar. is --(CH.sub.2).sub.3 --SO.sub.3.sup..crclbar., --CH.sub.2 --CHOH--CH.sub.2 --SO.sub.3.sup..crclbar., or ##STR2## R' and H is, alkyl with 1-6 C atoms, --CH.dbd.CH.sub.2, or --CO.sub.2 Na.

REFERENCES:
patent: 3576724 (1971-04-01), Reddy
patent: 3793162 (1974-02-01), Hope
patent: 4375392 (1983-03-01), Baker et al.
patent: 4673472 (1987-06-01), Morrissey et al.

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