Electrolithographic process which makes it possible to improve t

Details Electrolithographic process which makes it possible to improve t Electrolithographic process which makes it possible to improve t

1978-05-01

1980-03-25

Newsome, John H.

Stock material or miscellaneous articles

Structurally defined web or sheet

Discontinuous or differential coating, impregnation or bond

427 431, 430 5, 430942, 430323, B05D 306

Patent

active

041951085

ABSTRACT:
A process rendering certain electron masking resins more sensitive or rendering polymers which are unsufficiently sensitive to electrons suitable for industrial utilization, in particular for application to electron masking, a method which employs scanning with a very fine electron beam controlled by the computer. The process involves electron irradiation at low dose levels, sufficient however to create free radicals, followed by diffusion of an appropriate copolymerizing monomer by grafting to the initial polymeric chain opened by the irradiation process. The solubility of the copolymer vis-a-vis certain solvents is selective, enabling the masks to be developed.

REFERENCES:
patent: 2907675 (1959-10-01), Gaylord
patent: 2956899 (1960-10-01), Cline
patent: 3088791 (1963-05-01), Cline et al.
patent: 4041192 (1977-08-01), Heger et al.
Fredericks, "IBM Tech. Disc. Bull.," vol. 21, #7, Dec. 1978, p. 2824.

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