Electroless deposition employing laser-patterned masking layer

Details Electroless deposition employing laser-patterned masking layer Electroless deposition employing laser-patterned masking layer

1987-12-07

1989-09-12

Morgenstern, Norman

Coating processes

Electrical product produced

Welding electrode

427 98, 427271, 427304, 427305, B05D 512, B05D 306, B05D 304

Patent

active

048658731

ABSTRACT:
A metal is electrolessly plated on a substrate which is first coated with at least one ablatively-removable layer that is selectively irradiated with laser radiation to obtain a pattern for the deposition of metal on the substrate. The electroless plating solution applied to the substrate after the irradiated substrate is coated with a catalyst also serves to remove the unirradiated portion of the ablatively-removable layer. The method is particularly suited for plating fine lines of metal, especially on non-planar surfaces.

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IBM Research Highlights, "Heatless Laser Etching", Nov. 3, 1983.
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J. Vac. Sci. Technol., B1(4), Oct.-Dec., 1983.
N. Feldstein, "Selective Electroless Plating Techniques: A Survey", Plating, Aug., 1970, pp. 803-806.
D. J. Sharp, "Photoselective Metal Deposition", Plating, Aug., 1971, pp. 103-121.
Li et al., Applied Physics Letters, 46 (10), May 15, 1985, pp. 997-999.

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