Electrodeposition system and method therefor

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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204299EC, 204198, 204222, 118409, 118416, 118423, 118425, 134 76, 134 77, 134157, 134158, 1983463, 212210, 212220, 212221, C25D 1314, C25D 1702, B65G 4722, B66C 1706

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047723742

ABSTRACT:
A work processing system comprising: a plurality of work processing stations or tanks arranged in a predefined manner; superstructure means suspended above the process stations; a programmable controller situated remote from said processing stations for generating command signals; crane means suspended on and translatable relative to the superstructure and to the processing stations in response to said command signals; work carrier means carried by the crane means and adapted to be suspended and supported by a respective one of the processing stations; the work carrier unit comprising a work carrier member or platform adapted to support a workpiece and further including means for rotating the work carrier member or platform about a predetermined axis thereof in response to command signals.

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