Electrodeposition process for forming amorphous silicon

Details Electrodeposition process for forming amorphous silicon Electrodeposition process for forming amorphous silicon

1978-10-16

1980-03-11

Tufariello, T. M.

Chemistry: electrical and wave energy

Processes and products

136 89TF, 204 37R, C25D 302, C25D 550

Patent

active

041927206

ABSTRACT:
A method for electroplating amorphous silicon from a non-aqueous solution containing a silicon solute wherein a heat treatment is requisite to producing stable coatings of photoconductive amorphous silicon.

REFERENCES:
patent: 3022233 (1962-02-01), Olstowski
patent: 3595760 (1971-07-01), Ishibashi et al.
patent: 3990953 (1976-11-01), Austin

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