Electrodeposition of sulfur-bearing nickel

Details Electrodeposition of sulfur-bearing nickel Electrodeposition of sulfur-bearing nickel

1980-11-13

1982-05-18

Kaplan, G. L.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

204 43T, 204 49, 204112, 204113, 204263, 204266, C25C 108, C25D 312

Patent

active

043303803

ABSTRACT:
When the electrodeposition of nickel is carried out in the presence of sulphur, it is desirable to control the content and the distribution of the sulphur in the deposited nickel. Sulphur-bearing nickel is deposited onto a multiplicity of cathodes (12) in an electrolytic cell. The electrolyte contains nickel ions, chloride ions, and at least one thiocyanate compound. To prevent oxidation of the thiocyanate ions by the chlorine gas generated at the anode (11), the chlorine is almost completely excluded from the cathode compartment by providing a flow of electrolyte from the cathode (12) to the anode (11) and by continuously removing chlorine and chlorine-containing electrolyte from the anode through a manifold (26). A weir (14) prevents back flow.

REFERENCES:
patent: 4082641 (1978-04-01), Parkinson et al.
patent: 4087339 (1978-05-01), Elliot et al.
patent: 4155821 (1979-05-01), Grontoft

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