Chemistry: electrical and wave energy – Processes and products
Patent
1978-07-14
1980-02-19
Andrews, R. L.
Chemistry: electrical and wave energy
Processes and products
204105R, 204105M, 204106, 204108, 204107, 204109, 204110, 204111, 204112, 204113, 204114, 204115, 204116, 204117, 204123, 20490R, 204290F, 204293, C25D 350, C25B 1108, C25B 1110, C25C 100
Patent
active
041893581
ABSTRACT:
Ruthenium-iridium electrodeposits are prepared from aqueous acid solution containing ruthenium, iridium, a fluoborate salt, fluoboric acid, and optionally sulfamic acid. The baths are especially useful for preparing insoluble anodes.
REFERENCES:
patent: 3616445 (1971-10-01), Bianchi et al.
patent: 3846273 (1974-11-01), Bianchi et al.
Borner William G.
Scarpellino, Jr Anthony J.
Andrews R. L.
Leff Miriam W.
MacQueen Ewan C.
The International Nickel Company Inc.
LandOfFree
Electrodeposition of ruthenium-iridium alloy does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrodeposition of ruthenium-iridium alloy, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrodeposition of ruthenium-iridium alloy will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-652275