Chemistry: electrical and wave energy – Processes and products
Patent
1974-11-21
1976-06-29
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
C25D 338
Patent
active
039665658
ABSTRACT:
This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:
REFERENCES:
patent: 2849351 (1958-08-01), Gundel et al.
patent: 2849352 (1958-08-01), Kirstahler et al.
patent: 3000800 (1961-09-01), Strauss et al.
patent: 3023150 (1962-02-01), Willmund et al.
patent: 3081240 (1963-03-01), Strauss et al.
patent: 3267010 (1966-08-01), Creutz et al.
patent: 3328273 (1967-06-01), Creutz et al.
patent: 3542655 (1970-11-01), Kardos et al.
patent: 3650915 (1972-03-01), Quimby et al.
patent: 3682788 (1972-08-01), Kardos et al.
patent: 3732151 (1973-05-01), Abbott
Arcilesi Donald A.
Kardos Otto
Valayil Silvester P.
Auber Robert P.
Kaplan G. L.
M & T Chemicals Inc.
Spector Robert
Wheeless Kenneth G.
LandOfFree
Electrodeposition of copper does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrodeposition of copper, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrodeposition of copper will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1275638