Electrodeposition of amorphous alloys and products so produced

Stock material or miscellaneous articles – All metal or with adjacent metals – Composite; i.e. – plural – adjacent – spatially distinct metal...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204 431, 420431, C25D 356

Patent

active

045296685

ABSTRACT:
An electrodeposition process for depositing a boron-containing amorphous metallic layer onto a cathode from an electrodeposition bath having borophosphoric acid, dimethylamineborane or diethylamineborane; an ammonium salt of a hydroxycarboxylic acid or amino acid; and a source of the metallic ions. In one embodiment, tungsten-cobalt-boron amorphous alloys are deposited onto the cathode from a bath having borophosphoric acid, an ammonium salt of a hydroxycarboxylic acid or amino acid, a tungsten-containing salt and a cobalt-containing salt. In the preferred embodiment, the tungsten-containing salt is sodium tungstate, the cobalt-containing salt is cobalt sulphate, and the ammonium salt of a hydroxycarboxylic acid is ammonium citrate or ammonium tartrate. A range of bath compositions may be utilized to deposit the amorphous tungsten-cobalt-boron alloys onto the cathode, such alloys having high hardness and wear resistance and also having sufficient ductility to avoid cracking of the amorphous layer in fabrication and use. The electrodeposition process is preferably conducted at a voltage greater than the hydrogen over-voltage of the bath composition, and at a current density greater than about 20 milliamps per square centimeter.

REFERENCES:
patent: 4019910 (1977-04-01), Mallory, Jr.
patent: 4101389 (1978-07-01), Uedaira
patent: 4160854 (1979-07-01), D'Silva
patent: 4264641 (1981-04-01), Mahoney et al.
patent: 4268584 (1981-05-01), Ahn et al.
patent: 4297135 (1981-10-01), Giessen et al.
patent: 4341846 (1982-07-01), Hough et al.
patent: 4397812 (1983-10-01), Mallory, Jr.
G. Zhelis et al., Zashchita Metallov, vol. 17, No. 5, pp. 594-596, Sep.-Oct. 1981.
Electrochemical Science & Technology (2/72) vol. 119, No. 2, entitled Structure of Non Crystalline Co-25 a/o W Electrodeposit, pp. 168-172 by T. Omi and H. Yamamoto and H. L. Glass.
Pulsed Electrodeposition of Amorphous and Composite Alloys (9/1/83) by Rolf Weil & Chin-Chang Nee, U.S. Army Research Office, Contract No. DAAG-27-60-C-0056, Stevens Institute of Technology.
Journal of Magnetism and Magnetic Materials 19 (1980), pp. 157-158 entitled Electrodeposited Amorphous Alloys with High Permeabilities by G. Dietz and H. Bestgen.
J. Appl. Phys. 50(4), Apr. 1979, Department of Eng'g and Applied Science, Yale Univ. New Haven Conn. (pp. 2713-2719) entitled Structural Characterization of Amorphous Electrodeposited Cobalt-Phosphorus Alloys by G. C. Chi and G. S. Cargill, III.
Electrochemical Science and Technology (Jun. 1974) Electrodeposition of an Amorphous Cobalt Rhenium Alloy by P. J. Cote, G. P. Capsimalis, and V. P. Greco (pp. 776-777).
Metals Handbook Ninth Edition, vol. 5, (ASM) Surface Cleaning, Finishing, and Coating (pp. 170-187 entitled Hard Chromium Plating by Hyman Chessin); and (pp. 219-242 entitled Electroless Nickel Plating by William D. Fields).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electrodeposition of amorphous alloys and products so produced does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrodeposition of amorphous alloys and products so produced, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrodeposition of amorphous alloys and products so produced will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1735993

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.