Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1987-11-27
1989-07-25
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204300EC, C25D 1300
Patent
active
048511021
ABSTRACT:
This invention relates to an electrodeposition coating system, wherein an article to be coated as being an electrode on one side and a plurality of membrane electrodes as being electrodes on the other side are provided in one and the same bath. Voltage supply to at least part of the membrane electrodes are made switchable or the voltage is made variable to a desirable value. Voltage regulation and the like to the membrane electrodes are possible in accordance with the shape of the article to be coated, so that a uniform coating surface can be formed on the article to be coated.
REFERENCES:
patent: 4284493 (1981-08-01), Case
patent: 4486284 (1984-12-01), Mori et al.
patent: 4663014 (1981-05-01), Bassett
patent: 4711709 (1987-12-01), Inoue
Metal Finishing, G. E. F. Brewer, Sep. 1980, pp. 55-59.
Patent Abstracts of Japan, vol. 10, No. 362(C-389)(2419), 4th Dec. 1986; & JP-A-61 157 698 (Daihatsu Motor Co., Ltd) 17-07-1986.
Patent Abstracts of Japan, vol. 11, No. 8 (C-396) (2455), 9th Jan. 1987; & JP-A-61 183 499 (Kansai Paint Co., Ltd), 16-08-1986.
Siemens Power Engineering, vol. 5, No. 2, Mar./Apr. 1983, pp. 68-73, Passau, Ger.; K. Matheis: "Power Supply System for a Cathodic Electro-Coating Plant".
Hsing Ben C.
Niebling John F.
Poly Techs Inc.
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