Electrodeposition coating process of photoresist for printed cir

Details Electrodeposition coating process of photoresist for printed cir Electrodeposition coating process of photoresist for printed cir

1989-03-28

1990-02-06

Tufariello, T. M.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

C25D 1304

Patent

active

048986569

ABSTRACT:
An electrodeposition coating process of a photoresist for printed circuit board which comprises electrodeposition coating on a conductive surface a photosensitive electrodeposition coating composition (A), and thereafter further electrodeposition coating on the resultant coated plate an electrodeposition coating composition (B) composed chiefly of water-soluble or water-dispersible resin having a glass transition temperature (Tg) not lower than 20.degree. C.

REFERENCES:
patent: 4421620 (1983-12-01), Kaylo

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