Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-05-26
1995-06-06
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430192, 430313, G03F 7023
Patent
active
054222222
ABSTRACT:
A positive-type photosensitive electrodeposition coating composition comprising (A) a photosensitive compound having a molecular weight of not more than 6,000 and containing at least one modified quinonediazidesulfone units represented by the following formula (I) ##STR1## wherein R.sub.1 represents ##STR2## R.sub.2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group,
REFERENCES:
patent: 3046110 (1962-07-01), Schmidt
patent: 3130049 (1964-04-01), Neugebauer
patent: 3759711 (1973-09-01), Rauner et al.
patent: 3902906 (1975-09-01), Iwama et al.
patent: 4632900 (1986-12-01), Demmer et al.
patent: 4898656 (1990-02-01), Hoshino et al.
patent: 4975351 (1990-12-01), Akaki et al.
patent: 5134054 (1992-07-01), Iwasawa et al.
patent: 5162190 (1992-11-01), Zahn et al.
Akaki Yuw
Higashi Junichi
Iwasawa Naozumi
Bowers Jr. Charles L.
Chu John S.
Kansai Paint Co. Ltd.
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