Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1986-01-02
1987-05-05
Williams, Howard S.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204198, 204237, 204300EC, B65G 4902, C25D 1900
Patent
active
046630147
ABSTRACT:
Electrodeposition coating apparatus is disclosed for charging and applying a liquid coating material, such as a water based resin solution, to oppositely charged workpieces with increased efficiency. The apparatus includes a tank constructed from hollow vertical, V-shaped columns, side panels extending therebetween and reinforcing members extending along the exterior. The tank includes a liquid level control weir and liquid circulation eductors and nozzles on its sides, ends and bottom for circulating the liquid coating material within the tank. Electrodes for electrically charging the coating liquid are recessed between the vertical, sidewall columns to minimize any flow disruption or turbulence within the tank while provided sufficient liquid contact for proper charging. A separate liquid recirculation tank is provided adjacent the main tank for collecting and pumping liquid which flows over the weir back to the liquid circulation system.
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Bassett I. Jay
Case Leo L.
Bassett I. Jay
Williams Howard S.
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