Electrodeposition apparatus with virtual anode

Details Electrodeposition apparatus with virtual anode Electrodeposition apparatus with virtual anode

1994-10-19

1998-03-03

Gorgos, Kathryn

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204297R, C25D 366

Patent

active

057230285

ABSTRACT:
An electrochemical etching step in a semiconductor device fabrication process increases the radius of curvature of edges of metal lines deposited on the semiconductor device. The metal lines are fabricated by forming a mask, electrodepositing the metal, and removing the mask, and the electrochemical etching step in performed subsequently. The increased radius of curvature of the metal lines simplifies subsequent planarization and decreases line-to-line capacitance, thereby enhancing device performance. In an apparatus for performing the fabrication process, wires sown into a gasket which secures the semiconductor wafer and prevents electrolyte leakage, allows the gasket to function also as a component of the cathode. A more uniform metal deposition is created by a virtual anode, i.e., a metal plate having an aperture and being located between the anode and the cathode.

REFERENCES:
Perakh, M., "Slot-Type Field-Shaping Cell: Theory, Experiment And Application"; Surface Coating Technology, 31 (1987), pp. 409-426.

Affiliated with

Also associated with

Rating

Electrodeposition apparatus with virtual anode does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrodeposition apparatus with virtual anode, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrodeposition apparatus with virtual anode will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2244938