Electrodeposited copper foil for PCB having barrier layer of...

Stock material or miscellaneous articles – All metal or with adjacent metals – Composite; i.e. – plural – adjacent – spatially distinct metal...

Reexamination Certificate

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C205S152000, C205S238000, C205S245000, C205S255000, C205S155000, C428S607000, C428S668000, C428S674000, C428S675000, C428S926000, C428S935000

Reexamination Certificate

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06893738

ABSTRACT:
An electrodeposited copper foil to be laminated on an insulation substrate for a printed circuit board, comprising a barrier layer of ternary alloy of Zn—Co—As formed on the copper foil, is provided. Further, a surface treatment method of an electrodeposited copper foil for a printed circuit board, comprising electrolytically treating the copper foil in an electrolytic solution containing pyrophosphoric acid potassium of about 10 g/l to about 200 g/l, Zn of about 0.1 g/l to about 20 g/l, Co of about 0.1 g/l to about 20 g/l and As of about 0.05 g/l to about 5 g/l, is provided. Further, the electrolytic solution remains at the temperature of about 20° C. to about 50° C. and a pH of about 9 to about 13. The copper foil is electrolytically treated for about 2 seconds to about 20 seconds at a cathode current density of about 0.5 A/dm2to about 20 A/dm2.

REFERENCES:
patent: 3585010 (1971-06-01), Luce et al.
patent: 4049481 (1977-09-01), Morisaki
patent: 5366814 (1994-11-01), Yamanishi et al.
patent: 6342308 (2002-01-01), Yates et al.
patent: 1019930001934 (1993-03-01), None
patent: 93006103 (1993-07-01), None
patent: 100294394 (2001-04-01), None

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