Electrode structure of a semiconductor device which uses a coppe

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – With means to prevent contact from penetrating shallow pn...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257635, 257747, 257750, 257762, 257780, H01L 2348

Patent

active

052930734

ABSTRACT:
A semiconductor device comprises a semiconductor substrate, a first insulation film formed on the semiconductor substrate, a metal film for forming a bonding pad on the first insulation film, and a second insulation film which is formed between the first insulation film and the bonding pad and which is stiffer than the first insulation film.

REFERENCES:
patent: 3408238 (1968-10-01), Sanders
patent: 3475234 (1969-10-01), Kerwin et al.
patent: 3528168 (1970-09-01), Apamic, Jr.
patent: 3887407 (1975-06-01), Ono et al.
patent: 4060828 (1977-11-01), Satonaka
patent: 4149307 (1979-04-01), Henderson
patent: 4231050 (1980-10-01), Casey, Jr. et al.
patent: 4507673 (1985-03-01), Aoyama et al.
patent: 4646126 (1987-02-01), Iizuka
patent: 4796084 (1989-01-01), Kamasaki et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electrode structure of a semiconductor device which uses a coppe does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrode structure of a semiconductor device which uses a coppe, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrode structure of a semiconductor device which uses a coppe will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-156022

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.