Electrode structure, electrolytic etching process and apparatus

Details Electrode structure, electrolytic etching process and apparatus Electrode structure, electrolytic etching process and apparatus

1997-12-03

1999-11-30

Valentine, Donald R.

Electrolysis: processes, compositions used therein, and methods

Electrolytic erosion of a workpiece for shape or surface...

Gap maintenance or defined tool-workpiece gap

205656, 205658, 205659, 205671, 205674, 204224M, 204272, 204273, 204289, 204292, 204293, 204294, C25F 312, C25F 700

Patent

active

059936371

ABSTRACT:
An electrode structure is constituted by a first electrode, and at least one second electrode providing a pair of opposite portions with a prescribed spacing therebetween at which the first electrode is disposed. The electrode structure is suitably used for electrolytic etching and is effective in providing an accurate etching pattern without damaging the surface of an etching object.

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patent: 4236992 (1980-12-01), Themy
patent: 4337136 (1982-06-01), Dahlgren
patent: 4419530 (1983-12-01), Nath
patent: 4869881 (1989-09-01), Collins
patent: 5062933 (1991-11-01), Nakano
patent: 5286944 (1994-02-01), Li
patent: 5507932 (1996-04-01), Robinson

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