Electrode sputtering process for exhaust gas oxygen sensor

Details Electrode sputtering process for exhaust gas oxygen sensor Electrode sputtering process for exhaust gas oxygen sensor

1979-11-30

1981-03-03

Tung, T.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204195S, C23C 1500

Patent

active

042539315

ABSTRACT:
A method of sputtering platinum onto a vitrified zirconia thimble to form an exhaust electrode for an electrochemical-type exhaust gas oxygen sensor. The electrode is sputtered under an atmosphere consisting essentially of more than about 50% oxygen and/or nitrogen by volume. Sensors having low symmetrical transition times are produced.

REFERENCES:
patent: 3978006 (1976-08-01), Topp et al.
patent: 4021326 (1977-03-01), Pollner et al.
patent: 4116883 (1978-09-01), Rhodes
patent: 4136000 (1979-01-01), Davis et al.
L. I. Maissel et al., Handbook of Thin Film Technology, McGraw-Hill Book Co., New York, 1970, pp. 4-26 to 4-31.

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