Electrode plate and jig for use in plasma etching

Details Electrode plate and jig for use in plasma etching Electrode plate and jig for use in plasma etching

1993-06-04

1999-02-16

Nuzolillo, M.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

20429831, 252502, 252510, 252511, 423445R, C23F 102, H01B 104

Patent

active

058716092

ABSTRACT:
An electrode plate for use in plasma etching, which includes a vitreous carbon material produced from a polycarbodiimide resin as a raw material, or from a phenolic resin and a polycarbodiimide resin each as a raw material.
The vitreous carbon material produced from a polycarbodiimide resin or from a phenolic resin and a polycarbodiimide resin, has no or substantially no pores and has a high strength. Therefore, it exhibits excellent properties when used in an electrode plate for plasma etching.

REFERENCES:
patent: 2941966 (1960-06-01), Campbell et al.
patent: 5074456 (1991-12-01), Degner et al.
patent: 5093214 (1992-03-01), Saito et al.

Affiliated with

Also associated with

Rating

Electrode plate and jig for use in plasma etching does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrode plate and jig for use in plasma etching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrode plate and jig for use in plasma etching will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2058907