Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device
Reexamination Certificate
2006-06-19
2011-10-25
Berman, Susan W (Department: 1765)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Charge transfer device
C427S058000, C427S077000, C427S510000, C438S584000, C438S674000, C430S270100, C430S311000, C430S319000, C522S164000
Reexamination Certificate
active
08044441
ABSTRACT:
Provided is an electrode patterning layer used for forming an electrode pattern of any optional shape depending on the difference in wettability with an electrode-forming solution, the electrode patterning layer employing a polyimide type resin which is highly reliable as an electronic material. The electrode patterning layer is prepared by irradiating a layer comprising a polyamic acid having repeating units at the formula (1) or a polyimide obtainable by cyclodehydration of such a polyamic acid, with ultraviolet ray in a pattern shape:wherein A is a tetravalent organic group, B is a bivalent organic group, each of A and B may be of a single type or plural types, and n is a positive integer, provided that at least one type of A is a tetravalent organic group having an alicyclic structure.
REFERENCES:
patent: 4877718 (1989-10-01), Moore et al.
patent: 5024922 (1991-06-01), Moss et al.
patent: 5238784 (1993-08-01), Tokoh et al.
patent: 5792807 (1998-08-01), Hayashihara et al.
patent: 6010825 (2000-01-01), Hagen et al.
patent: 6048663 (2000-04-01), Fujii et al.
patent: 6159654 (2000-12-01), Machida et al.
patent: 6489431 (2002-12-01), Ishii et al.
patent: 6875554 (2005-04-01), Hatanaka et al.
patent: 6927274 (2005-08-01), Nomura et al.
patent: 7612455 (2009-11-01), Tano et al.
patent: 7800720 (2010-09-01), Tsuchiya et al.
patent: 2004/0238816 (2004-12-01), Tano et al.
patent: 2000 223270 (2000-08-01), None
patent: 2004 146478 (2004-05-01), None
patent: 2004 273851 (2004-09-01), None
patent: 2004 349638 (2004-12-01), None
patent: 2005 86188 (2005-03-01), None
patent: 2005 93799 (2005-04-01), None
U.S. Appl. No. 12/302,031, filed Nov. 24, 2008, Maeda, et al.
Maeda Shinichi
Ono Go
Berman Susan W
Nissan Chemical Industries Ltd.
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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