Electrode insulator materials for use in extreme ultraviolet...

Details Electrode insulator materials for use in extreme ultraviolet... Electrode insulator materials for use in extreme ultraviolet...

2003-01-21

2004-09-07

Lee, John R. (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S493100, C378S119000

Reexamination Certificate

active

06787788

ABSTRACT:

BACKGROUND
A microchip manufacturing process may deposit various material layers on a wafer and form a photosensitive film (photoresist) on the deposited layers. The process may use lithography to transmit light through (transmissive optics) or reflect light from (reflective optics) a reticle (patterned mask) onto the photoresist, which transfers a patterned image onto the photoresist. The process may remove portions of the photoresist which are exposed to light. The process may etch portions of the wafer which are not protected by the remaining photoresist. Some of these acts may be repeated.


REFERENCES:
patent: 5521389 (1996-05-01), Kim
patent: 5945677 (1999-08-01), Leung et al.
patent: 6356618 (2002-03-01), Fornaciari et al.
patent: 6452194 (2002-09-01), Bijkerk et al.
patent: 6566668 (2003-05-01), Rauch et al.
patent: 6586757 (2003-07-01), Melnychuk et al.

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