Electrode for plasma etching system

Details Electrode for plasma etching system Electrode for plasma etching system

1985-07-29

1986-09-16

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 156646, 156656, 204298, C23F 102, B44C 122, C03C 1500

Patent

active

046120777

ABSTRACT:
An electrode includes a plurality of nested concentric rings forming plenum chambers. Process gas is fed into the plenum chambers through capillary tubes. The gas is then delivered through slits between the rings into a plasma etching reactor.

REFERENCES:
patent: 4277304 (1981-07-01), Horiike et al.
patent: 4340462 (1982-07-01), Koch
patent: 4534816 (1985-08-01), Chen et al.

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