Electrode for plasma etching

Details Electrode for plasma etching Electrode for plasma etching

1997-04-18

1999-12-28

Mayekar, Kishor

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

20429831, 118723E, C23F 102

Patent

active

060076720

ABSTRACT:
Disclosed is an electrode for parallel plate type plasma etching, which is capable of suppressing the generation of dust. The electrode has a flatness in a range of from 0.001 to 5 mm and has a (positive) camber that the front surface side of the electrode is recessed and the back surface side thereof projects.

REFERENCES:
patent: 5004322 (1991-04-01), Verhulst et al.
patent: 5252196 (1993-10-01), Sonnenberg et al.
patent: 5681195 (1997-10-01), Egami et al.
patent: 5853523 (1998-12-01), Machida et al.
Patent Abstracts of Japan, Publication No. 61206225 (Sep. 12, 1986).

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