Electrode for plasma etching

Details Electrode for plasma etching Electrode for plasma etching

1997-04-18

1999-09-14

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

20429831, 20429833, H05H 100

Patent

active

059518146

ABSTRACT:
Disclosed is an electrode for plasma etching, which is inexpensive and is capable of reducing the generation of dust and keeping a high electrode performance. The electrode includes a portion to be consumed by plasma and the remaining portion, wherein the portion to be consumed by plasma is formed of metal silicon or a glassy carbon material, and the remaining portion is formed of a carbon material covered with a film of a glassy carbon material.

REFERENCES:
patent: 5324411 (1994-06-01), Ichishima et al.

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