Electrode for optical waveguide element and method of forming th

Details Electrode for optical waveguide element and method of forming th Electrode for optical waveguide element and method of forming th

2000-03-02

2000-10-31

Healy, Brian

Optical waveguides

Planar optical waveguide

Thin film optical waveguide

385 14, 385 40, 385129, 385130, 385131, 385141, G02B 610

Patent

active

061414786

ABSTRACT:
A metal film consisting of a first metal layer of at least one of Ta, Cr, W and Mo, a second metal layer of at least one of Au, Pt and Ag and a third metal layer of at least one of Ta, Cr, W and Mo superposed one on another in this order is formed on a surface of a substrate. Openings of predetermined shapes are formed in the metal film, and proton exchange is carried out on the surface of the substrate with the metal film used as a mask, thereby forming optical channel waveguides. Then the third metal layer is removed from the metal film, and the metal film consisting of the first and second metal layers into electrodes for applying an electric voltage to the optical channel waveguides.

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