Electrode for optical waveguide element and method of forming th

Details Electrode for optical waveguide element and method of forming th Electrode for optical waveguide element and method of forming th

1997-10-28

2000-05-09

Bowers, Charles

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

385129, H01L 2100

Patent

active

060603348

ABSTRACT:
When forming electrodes for an optical waveguide element, a metal film is formed on a surface of a substrate, and openings of predetermined shapes are formed in the metal film. Then proton exchange is carried out on the surface of the substrate with the metal film used as a mask, and optical channel waveguides are thus formed. At least a part of edge portions of the metal film defining the openings is left on the substrate and the metal film is plated with plating metal. The metal film plated with the plating metal is processed into electrodes of predetermined shapes for applying an electric voltage to the optical channel waveguides.

REFERENCES:
patent: 3616282 (1971-10-01), Bodway
patent: 5032220 (1991-07-01), Yamamoto et al.
patent: 5121237 (1992-06-01), Ikeda et al.
patent: 5617493 (1997-04-01), Nishimoto
patent: 5834055 (1998-11-01), Mahapatra et al.

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