Electrode for high contrast gas discharge panel and the method f

Details Electrode for high contrast gas discharge panel and the method f Electrode for high contrast gas discharge panel and the method f

1998-03-09

1999-09-14

O'Shea, Sandra

Electric lamp and discharge devices

With gas or vapor

313585, 313586, 313587, H01J 6100

Patent

active

059527811

ABSTRACT:
A Cr--C--F crystalline film was found to be suitable for use as a black matrix layer for use in conjunction with a Cr/Cu/Cr PDP electrode. Furthermore, film stack including the foregoing Cr--C--F layer, a gradated Cr--C--F transition layer and a pure Cr film can be formed in an integrated sputter deposition process and can be used as a black matrix/adhesion layers in PDP Cu electrode.

REFERENCES:
patent: 4556620 (1985-12-01), Thompson
patent: 5477105 (1995-12-01), Curtin et al.
patent: 5548181 (1996-08-01), Jones
patent: 5628882 (1997-05-01), O'Keefe et al.
Materials Letters 18, (1994) 251-256, M. J. O'Keefe et al., "Reactive Sputter Deposition of Crystalline Cr/C/F Thin Films".

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