Electrode assembly useful in confined plasma assisted chemical e

Details Electrode assembly useful in confined plasma assisted chemical e Electrode assembly useful in confined plasma assisted chemical e

1993-07-15

1994-03-29

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, B44C 122, H01L 21306

Patent

active

052981037

ABSTRACT:
An electrode assembly (10) for use in confined plasma assisted chemical etching includes an electrode (16) having a D.C. voltage source (46) connected thereto in addition to a source (60) of R. F. voltage such that ions formed during during plasma etching process are slowed or repelled from the electrode (16) as well as from a surrounding plasma confining member (18).

REFERENCES:
patent: 5006220 (1991-04-01), Hijikata et al.
patent: 5009738 (1991-04-01), Gruenwald et al.

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