Electrode arrangement

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure

Reexamination Certificate

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Details

C118S7230AN, C118S720000, C427S580000

Reexamination Certificate

active

06881270

ABSTRACT:
An electrode arrangement for the plasma-aided coating of a substrate (3) with a layer of material comprising at least one first and a second material component and for the production of a plasma discharge, more especially an arc discharge (35), having an anode arrangement (5), which provides the first material component at an anode material surface (13) for evaporation, and a cathode arrangement (7), which provides the second material component at a cathode material surface (25). The electrode arrangement is characterized in that the cathode material surface (25) is constituted by an evaporation-active part (27) supporting the plasma discharge (35) and an evaporation-inactive part (41) not supporting the plasma discharge. Preferably, a motion-producing means (49) is provided for moving the evaporation-inactive part (41) over the cathode material surface (25) in order to reduce deposit of material due to he first material component on the cathode material surface (25).

REFERENCES:
patent: 4868003 (1989-09-01), Temple et al.
patent: 5009922 (1991-04-01), Harano et al.
patent: 5015493 (1991-05-01), Gruen
patent: 4026494 (1992-02-01), None
patent: 1103630 (2001-05-01), None
patent: 11-100661 (1999-04-01), None
patent: 2001192815 (2001-07-01), None
patent: WO-9858095 (1998-12-01), None
patent: WO0046418 (2000-08-01), None
Search Report from corresponding European Application No. EP 00 12 4558, dated Mar. 13, 2001.

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