Electrode alloy having decreased hydrogen overpressure and/or lo

Details Electrode alloy having decreased hydrogen overpressure and/or lo Electrode alloy having decreased hydrogen overpressure and/or lo

1991-08-14

1993-08-24

Kalafut, Stephen

Chemistry: electrical current producing apparatus, product, and

Sealed cell having gas prevention or elimation means

Prevention or elimination means is one of the cell...

429101, 420900, H01M 438

Patent

active

052387569

ABSTRACT:
An electrochemical hydrogen storage alloy having decreased hydrogen overpressure as well as other desirable operational parameters, comprising on an atomic percent basis: 14 to 22 percent vanadium; 28 to 39 percent nickel; 7 to 15 percent titanium; 15 to 34 percent zirconium; and at least one member selected from the group consisting of 0.001 to 7 percent chromium, 0.001 to 7 percent cobalt, 0.001 to 7 percent iron, 0.001 to 3.6 percent manganese, and 0.001 to 2.7 percent aluminum, wherein the atomic ratio of the vanadium to zirconium is in the range of 1:2.26 to 1:0.68. An electrochemical hydrogen storage alloy having a reduced self-discharge rate comprising an alloy having a heterogeneous, disordered microstructure resulting from changes in the mutual solubility of the elements of the alloy, wherein hydrogen in a particular phase is not easily discharged either though low surface area, or an oxide of limited porosity or catalytic property.

REFERENCES:
patent: 4551400 (1985-11-01), Sapru
patent: 4728586 (1988-03-01), Venkatesan et al.
patent: 4849205 (1989-07-01), Hong

Affiliated with

Also associated with

Rating

Electrode alloy having decreased hydrogen overpressure and/or lo does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrode alloy having decreased hydrogen overpressure and/or lo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrode alloy having decreased hydrogen overpressure and/or lo will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-827734