Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1978-11-20
1981-12-22
Davie, James W.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
29570, 204164, G02F 117
Patent
active
043067735
ABSTRACT:
In the preferred embodiment, a novel tungsten oxide film is presented for incorporation into an electrochromic display device wherein a surface of the film is in contact with an acidic aqueous electrolyte. The film comprises an underlying layer consisting of true amorphous, electrochromic tungsten oxide and an integral surface layer consisting of nonelectrochromic, random network amorphous tungsten oxide that is substantially less soluble in the electrolyte than the underlying electrochromic tungsten oxide. Preferably, the surface layer is formed by treating a vapor-deposited tungsten oxide film by exposure to a low energy plasma to restructure the molecular bonding at the surface without affecting the underlying tungsten oxide. When the treated film is incorporated into a display device, the surface layer minimizes dissolution of the film into the electrolyte to substantially extend the useful lifetime of the device, but readily conducts protons between the underlying layer and the electrolyte so as not to significantly interfere with device cycling.
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R. S. Crandall et al., "Measurement of the Diffusion Coefficient of Electrons in WO.sub.3 Films", APL, vol. 26, No. 3, Feb. 1, 1975, pp. 120-121.
Davie James W.
Fekete Douglas D.
General Motors Corporation
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