Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1993-08-09
1995-07-04
Tung, T.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204424, 204429, 427125, 4271262, 4271263, G01N 27409
Patent
active
054297370
ABSTRACT:
In an electrochemical sensor, a gas analyzing electrochemical cell is implanted directly on a substrate wafer. The entire wafer is coated with enamel layers except at the places needed for the electrical connections. A fixing part fixes the sensor in a housing in such a way that the electrochemical cell is inside the housing which contains the gas to be analyzed. This fixing part provides imperviousness and prevents the gases from reaching the electrical connections.
REFERENCES:
patent: 3785947 (1974-01-01), Baldwin et al.
patent: 4061117 (1977-12-01), Ikeura
patent: 4272350 (1981-06-01), Croset et al.
patent: 4277323 (1981-07-01), Muller et al.
patent: 4283261 (1981-08-01), Maurer et al.
patent: 4334974 (1982-06-01), Muller et al.
patent: 4502939 (1985-03-01), Holfelder et al.
patent: 4505807 (1985-03-01), Yamada
patent: 4588494 (1986-05-01), Kato et al.
patent: 4741817 (1988-05-01), Croset et al.
patent: 4750256 (1988-06-01), Wertheimer et al.
Patent Abstracts of Japan, vol. 9, No. 177 (p.-375) [1900], Jul. 23, 1985.
Patent Abstracts of Japan, vol. 10, No. 15 (p-422) [2072]Jan. 21, 1986.
Perret Joel
Pribat Didier
Rouffy Jean C.
Velasco Gonzalo
"Thomson-CSF"
Tung T.
LandOfFree
Electrochemical sensor with integrated structure for the measure does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrochemical sensor with integrated structure for the measure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrochemical sensor with integrated structure for the measure will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-758187