Electrochemical reactor for copper removal from barren solutions

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204109, 204106, 204114, 204130, 204267, 204269, 204275, 204290R, 204292, 204294, C25C 112

Patent

active

049118048

ABSTRACT:
A system for treating a barren solution typically containing a heavy metal such as copper, and complexed cyanide, from a precious metal mill, is treated in a first electrochemical cell to remove the heavy metal and free the cyanide whereafter the treated solution can be returned to the precious metal mill as leaching solution; the barren solution flows through a porous cathode in which the heavy metal is electrochemically deposited, and against an inert anode; the deposited heavy metal is recovered in a sheet form by employing the heavy metal loaded cathode as an anode in a second electrochemical cell, the heavy metal entering solution and being deposited on a cathode sheet typically of stainless steel or titanium from which a deposited sheet of the heavy metal is readily peeled; the porous cathode free of heavy metal can be reused in the first cell.

REFERENCES:
patent: 4226685 (1980-10-01), Portal et al.
patent: 4396474 (1983-08-01), Astruc et al.
patent: 4445990 (1984-05-01), Kim et al.
patent: 4556469 (1985-12-01), Kim et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electrochemical reactor for copper removal from barren solutions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrochemical reactor for copper removal from barren solutions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrochemical reactor for copper removal from barren solutions will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1648689

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.