Electrochemical etching process for semiconductors

Details Electrochemical etching process for semiconductors Electrochemical etching process for semiconductors

1980-05-30

1981-12-22

Gantz, Delbert E.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

20412943, C25F 312, C25F 314

Patent

active

043069517

ABSTRACT:
A method of electrochemically etching a semiconductor to a predetermined contour includes positioning at least one electrode on one side of the semiconductor and then applying a voltage to the electrodes so as to generate a varying current density vertically through the semiconductor and thereby electrochemically etch the mask-free other side of the semiconductor.

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Meek, R. J., J. Electrochemical Soc. 118, 1240 (1971).
Wen, C. P. and Keller, W. D., J. Electrochemical Soc. 119, 547 (1972).
van Kijk, H. J. A. and deJonge, J., Electrochemical Soc. 117, 553 (1970).

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