Electrochemical etching process

Details Electrochemical etching process Electrochemical etching process

1993-02-05

1994-08-16

Valentine, Donald R.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

20412965, 2041297, 20412975, C25F 312, C25F 314

Patent

active

053384164

ABSTRACT:
A method of photo-assisted electrochemical machining of micromechanical structures from a silicon substrate having both p and n regions in a hydrofluoric electrolyte solution is disclosed. Both p and n regions of the silicon substrate may be selectively etched, with differing regions as etch stops, at controlled rates by the appropriate choice of cell bias, p-n junction bias and illumination intensity.

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