Electrochemical etching

Details Electrochemical etching Electrochemical etching

2005-03-15

2009-08-04

Vinh, Lan (Department: 1792)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S750000, C438S752000, C205S640000

Reexamination Certificate

active

07569490

ABSTRACT:
Methods to etch a workpiece are described. In one embodiment, a workpiece is disposed within an etchant solution having a composition comprising a dilute acid and a non-ionic surfactant. An electric field is generated within the etchant solution to cause an anisotropic etch pattern to form on a surface of the workpiece.

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