Electrochemical edge and bevel cleaning process and system

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Treating electrolytic or nonelectrolytic coating after it is...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C205S651000, C205S668000, C204S22400M, C204S22400M

Reexamination Certificate

active

07029567

ABSTRACT:
An edge cleaning system and method is disclosed in which a directed stream of a mild etching solution is supplied to an edge area of a rotating workpiece, including the front surface edge and bevel, while a potential difference between the workpiece and the directed stream is maintained. In one aspect, the present invention provides an edge cleaning system that is disposed in the same processing chamber that is used for deposition or removal processing of the workpiece. In another aspect, the mild etching solution used for edge removal is also used to clean the front surface of the wafer, either simultaneously with or sequentially with the edge removal process.

REFERENCES:
patent: 6056869 (2000-05-01), Uzoh
patent: 6309981 (2001-10-01), Mayer et al.
patent: 6352623 (2002-03-01), Volodarsky et al.
patent: 6610190 (2003-08-01), Basol et al.
patent: 6615854 (2003-09-01), Hongo et al.
patent: 6883063 (2004-12-01), Basol

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electrochemical edge and bevel cleaning process and system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrochemical edge and bevel cleaning process and system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrochemical edge and bevel cleaning process and system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3542430

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.