Electrolysis: processes – compositions used therein – and methods – Electrolytic analysis or testing
Reexamination Certificate
2004-05-04
2008-09-23
Olsen, Kaj K (Department: 1795)
Electrolysis: processes, compositions used therein, and methods
Electrolytic analysis or testing
C204S406000, C204S434000
Reexamination Certificate
active
07427346
ABSTRACT:
An electrochemical drive circuitry and method, such as may be employed in electroplating bath chemical monitoring. A microcontroller can be utilized to selectively apply galvanostatic or potentiostatic conditions on the electrochemical cell, for measurement of response of the electrochemical cell to such conditions, with the microcontroller arranged to generate an offset potential to control potential across the electrochemical cell within a range of potential accommodated by a unipolar power supply, and/or a CMOS analog switch can be employed in combination with individual digital-to-analog converters for each of the current-controlled and potential-controlled conditions, to provide high-speed, dual mode operating capability.
REFERENCES:
patent: 2707166 (1955-04-01), Brown et al.
patent: 2707167 (1955-04-01), Hoover et al.
patent: 2830014 (1958-04-01), Gundel et al.
patent: 2884366 (1959-04-01), Anderson et al.
patent: 2898282 (1959-08-01), Flook, Jr. et al.
patent: 3101305 (1963-08-01), Roth et al.
patent: 3276979 (1966-10-01), Strauss et al.
patent: 3288690 (1966-11-01), Creutz et al.
patent: 3655534 (1972-04-01), Kampe
patent: 3725220 (1973-04-01), Kessler
patent: 3798138 (1974-03-01), Ostrow et al.
patent: 3883414 (1975-05-01), Fujinaga et al.
patent: 3910830 (1975-10-01), Mayse
patent: 3950234 (1976-04-01), Faulkner et al.
patent: 3972789 (1976-08-01), Eppensteiner et al.
patent: 3996124 (1976-12-01), Eaton et al.
patent: 4038161 (1977-07-01), Eckles et al.
patent: 4071429 (1978-01-01), Wagenknecht et al.
patent: 4119532 (1978-10-01), Park
patent: 4132605 (1979-01-01), Tench et al.
patent: 4260950 (1981-04-01), Hadden et al.
patent: 4305039 (1981-12-01), Steuernagel et al.
patent: 4317002 (1982-02-01), Spicer
patent: 4388165 (1983-06-01), Koshiishi et al.
patent: 4496454 (1985-01-01), Berger
patent: 4498039 (1985-02-01), Galwey et al.
patent: 4529495 (1985-07-01), Marsoner
patent: 4568445 (1986-02-01), Cates et al.
patent: 4589958 (1986-05-01), Alexander et al.
patent: 4595462 (1986-06-01), Vangaever et al.
patent: 4707378 (1987-11-01), McBride et al.
patent: 4772375 (1988-09-01), Wullschleger et al.
patent: 4812210 (1989-03-01), Bonivert et al.
patent: 4849330 (1989-07-01), Humphries et al.
patent: 4917774 (1990-04-01), Fisher
patent: 4917777 (1990-04-01), Fisher
patent: 5017860 (1991-05-01), Germer et al.
patent: 5074157 (1991-12-01), Marsoner et al.
patent: 5131999 (1992-07-01), Gunasingham
patent: 5162077 (1992-11-01), Bryan et al.
patent: 5192403 (1993-03-01), Chang et al.
patent: 5223118 (1993-06-01), Sonnenberg et al.
patent: 5268087 (1993-12-01), Lu
patent: 5288387 (1994-02-01), Ito et al.
patent: 5296123 (1994-03-01), Reddy et al.
patent: 5316649 (1994-05-01), Kronberg
patent: 5320721 (1994-06-01), Ludwig et al.
patent: 5325038 (1994-06-01), Banzai et al.
patent: 5352350 (1994-10-01), Andricacos et al.
patent: 5404018 (1995-04-01), Yasuda et al.
patent: 5447802 (1995-09-01), Tobiyama et al.
patent: 5462645 (1995-10-01), Albery et al.
patent: 5612698 (1997-03-01), Reay
patent: 5635043 (1997-06-01), Tur'yan et al.
patent: 6022470 (2000-02-01), Yarnitzky
patent: 6210640 (2001-04-01), Ruth et al.
patent: 6231743 (2001-05-01), Etherington
patent: 6254760 (2001-07-01), Shen et al.
patent: 6270651 (2001-08-01), Essalik et al.
patent: 6280602 (2001-08-01), Robinson
patent: 6288783 (2001-09-01), Auad
patent: 6365033 (2002-04-01), Graham et al.
patent: 6366794 (2002-04-01), Moussy et al.
patent: 6395152 (2002-05-01), Wang
patent: 6409903 (2002-06-01), Chung et al.
patent: 6458262 (2002-10-01), Reid
patent: 6459011 (2002-10-01), Tarr et al.
patent: 6478950 (2002-11-01), Peat et al.
patent: 6495011 (2002-12-01), Robertson
patent: 6558519 (2003-05-01), Dodgson et al.
patent: 6569307 (2003-05-01), Blachier et al.
patent: 6572753 (2003-06-01), Chalyt et al.
patent: 6592737 (2003-07-01), Robertson
patent: 6645364 (2003-11-01), Calvert et al.
patent: 6673226 (2004-01-01), Kogan et al.
patent: 6709568 (2004-03-01), Han et al.
patent: 6758955 (2004-07-01), Robertson
patent: 6758960 (2004-07-01), Robertson
patent: 6808611 (2004-10-01), Sun et al.
patent: 6827839 (2004-12-01), Sonnenberg et al.
patent: 6974531 (2005-12-01), Andricacos et al.
patent: 7022215 (2006-04-01), Schomburg
patent: 6984299 (2006-06-01), Han et al.
patent: 7094323 (2006-08-01), King et al.
patent: 2002/0070708 (2002-06-01), Wu
patent: 2003/0080000 (2003-05-01), Robinson
patent: 2004/0040842 (2004-03-01), King et al.
patent: 2004/0055888 (2004-03-01), Wikiel et al.
patent: 2004/0065561 (2004-04-01), Chalyt et al.
patent: 2005/0016847 (2005-01-01), Buehler
patent: 2005/0067304 (2005-03-01), King et al.
patent: 2005/0109624 (2005-05-01), King et al.
patent: 2005/0224370 (2005-10-01), Liu et al.
patent: 2005/0241948 (2005-11-01), Han et al.
patent: 2006/0102475 (2006-05-01), Han et al.
patent: 2006/0266648 (2006-11-01), King et al.
patent: 19911447 (2000-12-01), None
patent: 0 302 009 (1988-07-01), None
patent: 2001-073183 (2001-03-01), None
patent: WO 01/29548 (2001-04-01), None
Alexander Milchev, “A Galvanostatic Study of Electrochemical Nucleation”, J. Electroanal. Chem., 333 (1992), 93-102.
“Aldrich Handbook of Fine Chemicals and Laboratory Equipment”, 2003-2004, pp. 500, 501 and 1634, Publisher: Aldrich Chemical Co., Published in: Milwaukee, WI.
Bard, Allen J., et al., Electrochemical Methods: Fundamentals and Applications, 2nd Edition, 2001, pp. 15-16, Publisher: John Wiley & Sons, Inc., Published in: New York.
Freitag, Walter O., et al., Determination of the individual additive components in acid copper plating baths, Plat. Surf. Fin., Oct. 1983, pp. 55-60, vol. 70, No. 10.
Healy, John P., et al., The chemistry of the additives in an acid copper electroplating bath: Part II. The instability 4,5-dithiaoctane-1, . . . , J. Electoanal. Chem., Oct. 1992, pp. 167-177, vol. 338, No. 1-2.
Healy, John P., et al., The chemistry of the additives in an acid copper electroplating bath: Part III. The mechanism of brightening by 4,5- . . . , J. Electroanal. Chem., Oct. 1992, pp. 179-187, vol. 338, No. 1-2.
Huiliang, Huang, et al., Flow potentiometric and constant-current stripping analysis for mercury(II) with gold, platinum and carbon fibre . . . , Analytica Chimica Acta, 1987, pp. 1-9, vol. 201.
Kim, Jae Jeong, et al., Catalytic behavior of 3-mercapto-1-propane sulfonic acid on Cu electrodeposition and its effect on Cu film properties . . . , J. Electronanal. Chem., Jan. 30, 2003, pp. 61-66, vol. 542, No. 1.
Liu, Yonghui, Testing Technology of Electrochemistry, (English relevance attached), 1987, p. 159, Published in: Beijing.
Metrohm, Product description of 731 Relay Box, Downloaded May 11, 2005 from http://www.metrohm.com/products/05/acc/731/731.html, May 11, 2005.
Metrohm, Product description of 772 Pump Unit, Downloaded May 11, 2005 from http://www.metrohm.com/products/05/acc/772/772.html, May 11, 2005.
Metrohm, Product description of MVA-3 voltammetry system, Downloaded May 11, 2005 from http://www.metrohm.com/products/06/mva/mva03/mva03.html, May 6, 2004.
Metrohm, Product description of Titrando Dosino, http://www.metrohm.com/titrando/products/units/800/800.html, 2003.
Metrohm, Product description of Titrando PC Control, Downloaded May 11, 2005 from http://www.metrohm.com/titrando/products/control/pc/pc.html, 2004.
Milchev, Alexander, et al., A galvanostatic study of electrochemical nucleation, J. Electrocanal. Chem., Jul. 25, 1992, pp. 93-102, vol. 333, No. 1-2.
Oldham, Keith B., et al., Fundamentals of Electrochemical Science, 1994, pp. 328-332, Publisher: Academic Press, Inc., Published in: San Diego.
Tench, Dennis, et al., Cyclic pulse voltammetric stripping analysis of acid copper plating baths, J. Electrochem. Soc., Apr. 1985, pp. 831-834, vol. 132, No. 4.
Vereecken, P.M., et al., The chemistry of additives in damascene copper plating, IBM J. Res. Dev., Jan. 2005, pp. 3-18, vol. 49, No. 1.
Wojciechowski, Marek, et al., Square-wave anodic stripping voltammetry of lead and cadmium at cylindrical graphite fiber microelectrodes with . . . , Analytica Chimica Acta, 1991, pp. 433
Lurcott Steven
Tom Glenn M.
Advanced Technology & Materials Inc.
Chappuis Margaret
Hultquist Steven J.
Intellectual Property / Technology Law
Olsen Kaj K
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