Electroabsorption optical intesity modulator having a plurality

Optical: systems and elements – Deflection using a moving element – Using a periodically moving element

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359181, 359248, 385131, 385 5, H04B 1004

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active

059992980

ABSTRACT:
In an electroabsorption optical intensity modulator, a semiconductor buffer, a first semiconductor cladding layer, a semiconductor optical absorption layer, a second semiconductor cladding layer and a semiconductor cap layer are formed on a semiconductor substrate. Also, a first electrode is formed on the second semiconductor cap layer, and a second electrode is formed on a second surface of the semiconductor substrate. The semiconductor optical absorption layer includes a first semiconductor optical absorption layer element having a first absorption edge wavelength and a second semiconductor optical absorption layer element having a second absorption edge wavelength different from the first absorption edge wavelength.

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Japanese Office Action dated Jun. 16, 1998 with English Language translation of Japanese Examiner's comments.
Komatsu, K., et al., "1.55 .mu.m Wavelength--2.4 Gb/s InGaP/InP Franz-Keldysh Type Optical Modulators Grown by Selective Metal-Organic Vapor Phase Epitaxy," IEICE, Aug. 15, 1993.
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Ishizaka, M., et al., "Analysis on Blue Chirp Mechanism and the Torlerance of a Modulator Integrated DFB Laser," ICICE, p. 236, Aug. 30, 1996.
K. Yamada, et al., "Low-chirp, low-polarization dependent characteristics of electroabsoption optical intensity modulator with an InGaAsP bulk," IEICE, Technical, vol. 1, p. 349, 1995.
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