Fluid sprinkling – spraying – and diffusing – Processes
Patent
1992-06-22
1994-05-17
Kashnikow, Andres
Fluid sprinkling, spraying, and diffusing
Processes
239 72, 118688, B67D 500, B05B 1700
Patent
active
053120396
ABSTRACT:
Method and apparatus for monitoring the fluid spray pattern of fluid sprayed by a nozzle onto a semiconductor wafer during processing of the wafer. A light source is positioned to illuminate the fluid sprayed in a pattern P from the nozzle, and one or more photodetectors are positioned to receive light scattered by the fluid spray. Each photodetector develops an electrical signal in response to receipt of the scattered light, and these electrical signals are received and analyzed by a comparison means. One or more reference signals representing a desired fluid spray pattern P.sub.0 is stored in the comparison means, and each electrical signal for the pattern P is compared with the corresponding reference signal for the pattern P.sub.0 by the comparison means. If one or more signal for the pattern P differs substantially from the corresponding reference signal for the desired pattern P.sub.0, an alarm may be generated and/or delivery of fluid by the nozzle may be terminated.
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Page Allen
Sayka Anthony
Kashnikow Andres
Morris Lesley D.
VLSI Technology Inc.
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