Chemistry: electrical and wave energy – Apparatus – Electrophoretic or electro-osmotic apparatus
Reexamination Certificate
2011-01-04
2011-01-04
Mayekar, Kishor (Department: 1795)
Chemistry: electrical and wave energy
Apparatus
Electrophoretic or electro-osmotic apparatus
Reexamination Certificate
active
07862701
ABSTRACT:
An electro-dipcoating apparatus is described in which, in conventional manner, a work-piece to be lacquered is dipped into a lacquer bath, moved through the latter, and lifted out again in a continuous process. Along the path of motion of the work-piece in the lacquer bath there are arranged electrodes which are connected to a first pole of at least one voltage source. Several contact rails extend parallel to one another without electrical interruption along the entire path of motion of the work-piece leading through the lacquer bath and are each connected to the second pole of varying voltage sources. To each work-piece a contact device is assigned which can be brought into communication with a respective one of the several contact rails and in this way applies the potential of the second pole of the corresponding voltage source to the work-piece. In this way, cuts in the contact rails are avoided that would result in wear of the contact devices and in increased control effort.
REFERENCES:
patent: 5223116 (1993-06-01), Hosten
patent: 5494561 (1996-02-01), Darche et al.
patent: 2008/0271993 (2008-11-01), Noller
patent: 1 970 438 (1967-10-01), None
patent: 200 00 970 (2000-04-01), None
patent: 199 42 556 (2001-03-01), None
Hablizel Andreas
Hoffmann Markus
Mauk Wolfgang
Noller Thomas
Eisenmann Anlagenbau GmbH & Co. KG
Factor & Lake, Ltd.
Mayekar Kishor
LandOfFree
Electro-dipcoating apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electro-dipcoating apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electro-dipcoating apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2650772