Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Patent
1980-11-17
1982-05-25
Martin, Jr., Roland E.
Radiation imagery chemistry: process, composition, or product th
Imaged product
Including resin or synthetic polymer
430 37, 528290, 528292, G03G 1704
Patent
active
043317510
ABSTRACT:
Electrically photosensitive materials and elements comprising an electrically photosensitive polymeric compound of the structure: ##STR1## wherein: R.sub.1 and R.sub.3, which are the same or different, represent a substituted or unsubstituted alkyl group having from 1 to 18 carbon atoms or a substituted or unsubstituted aryl group;
REFERENCES:
patent: 4076527 (1978-02-01), Nealy
patent: 4092162 (1978-05-01), Wright et al.
Isaacson Henry V.
Wright Beth G.
Wright Hal E.
Dahl Torger N.
Eastman Kodak Company
Martin Jr. Roland E.
LandOfFree
Electrically photosensitive materials and elements for photoelec does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrically photosensitive materials and elements for photoelec, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrically photosensitive materials and elements for photoelec will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2077326