Electrically-heated chemical process reactor

Details Electrically-heated chemical process reactor Electrically-heated chemical process reactor

2005-01-11

2005-01-11

Stoner, Kiley S. (Department: 1725)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Waste gas purifier

C422S199000, C422S187000

Reexamination Certificate

active

06841134

ABSTRACT:
An electrically-heated chemical process reactor having an inlet for receiving industrial gases, an internal channel for passing the flow of gases, and an outlet for expelling the gases. An array of current-carrying screen element packets are arranged along the channel for receiving a heating current, and the internal gas channel includes passages through the array for preheating the gas prior to entering the channel.

REFERENCES:
patent: 3811845 (1974-05-01), Nakamura
patent: 4692306 (1987-09-01), Minet et al.
patent: 5409669 (1995-04-01), Smith et al.
patent: 5453116 (1995-09-01), Fischer et al.
patent: 5711816 (1998-01-01), Kirlin et al.
patent: 6214296 (2001-04-01), Lou et al.
Olstead et al, “Organic Compound Destruction and Removal Efficiency (DRE) for Plasma Incinerator Off-gases Using an Electrically Heated Secondary Combustion Chamber” 1998 Proceedings on IT3 Conference, May 11, 1998, pp 419-421, Salt Lake City, UT.
Reed et al, “Electric Heater Development and Performance Data for Mach 14 Wind Tunnel”, Journal of Spacecraft and Rockets, vol. 12,No. 5 , pp 308-313, May, 1974.
“Phoenix Solutions Co.—Products and Services”, sales brochure, Nov., 1998.
Background/Qualifications of Phoenix Solutions Co . . . sales brochure, Jul. 15, 1996.

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