Electrically erasable read only memory

Static information storage and retrieval – Magnetic bubbles – Guide structure

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357 54, 357 59, 357 65, 365185, H01L 2978, H01L 2934, H01L 2904, G11C 1134

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042570565

ABSTRACT:
An electrically erasable floating gate storage cell (EPROM) is disclosed which comprises a body of single crystal silicon semiconductor material having a substrate of one conductivity type, a source region and a drain region each of a second conductivity type, a channel region of the first conductivity type connecting the source region and drain region, a polycrystalline silicon layer conductively connected to either the source region or the drain region, a conductive insulated floating gate which partially overlies and is separated from the polycrystalline silicon layer by a layer of silicon dioxide and a control gate which overlies and is separated from the floating gate by a layer of silicon dioxide. Fowler-Nordheim tunneling current occurs between the polycrystalline layer and the floating gate during programming and erasing of the EPROM. The floating gate influences the conductivity of the channel region in accordance with the charge stored thereon during programming. The control gate is oriented over the entire channel region to control the conductivity of the channel region in accordance with voltages applied thereto during operation of the EPROM.

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patent: 4087795 (1978-05-01), Rossler
patent: 4115914 (1978-09-01), Harari
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Rossler et al., "Erasable and Electrically Reprogrammable Read--Only Memory Using the N--Channel One--Transistor Cell", Siemens Forsch.--U Entwickl,--Ber. Bd. (1975), Nr. 6, pp. 345-351.
Barnes et al., "Operation and Characterization of N--Channel EPROM Cells", Solid--State Electronics, vol. 21, (1978), pp. 521-529.
Scheibe et al., "Technology of a New N--Channel One--Transistor EAROM Cell Called SIMOS", IEEE Trans. Electron Devices, vol. ED-24, (5/77), pp. 600-610.

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