Electrically erasable programmable read only memory

Static information storage and retrieval – Floating gate – Particular biasing

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357 23, G11C 1140

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active

044778830

ABSTRACT:
In an electrically erasable and programmable read only memory of this invention, each memory cell has an L-shaped floating gate insulated from a substrate. The floating gate and a first control gate, the floating gate and a second control gate, and the floating gate and a source electrode connected to a source are capacitively coupled at predetermined capacitances, respectively. A projecting portion which is formed in the source electrode underlies a coupling region of first and second gate portions of the floating gate. When a voltage of +20 V is applied to the source electrode and a voltage of 0 V is applied to the first and second gates, electrons stored in the floating gate of at least one desired memory cell may be discharged.

REFERENCES:
patent: 3728695 (1973-04-01), Frohman-Bentchkowsky
patent: 3825946 (1974-07-01), Frohman-Bentchkowsky
patent: 4099196 (1978-07-01), Simko
patent: 4257056 (1981-03-01), Shum
Electronics/Feb. 28, 1980, pp. 113-117, "16-K EE-Prom Relies on Tunneling for Byte-Erasable Program Storage", Johnson et al.
Electronics/Jul. 31, 1980, pp. 89-92, "Low-Power EE-Prom Can Be Reprogrammed Fast", by E. K. Shelton.
Triple Level Poly Silicon E.sup.2 Prom With Single Transistor Per Bit, Tech. Digest of IEDM 1980, pp. 602-605, by J. Kupec et al.
8032 Electronics International, vol. 52, No. 10, (May 10, 1979), C. Wallace, "Electrically Erasable Memory Behaves Like a Fast, Nonvolatile RAM," pp. 128-131.
IEEE Transactions on Electron Devices, vol. ED-24, No. 5, (May 1977), J. Kupec et al., "Triple Level Poly Silicon E2prom With Single Transistor Per Bit," pp. 602-606.

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