Electrically activated implant

Surgery: light – thermal – and electrical application – Light – thermal – and electrical application – Electrical therapeutic systems

Reexamination Certificate

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Reexamination Certificate

active

06917831

ABSTRACT:
This invention relates to an electrically active implant with a plurality of energy-consuming components and an activation device designed to activate the implant. The electrically active implant is characterized by a deactivation device designed to deactivate the energy-consuming components of the implant, where the energy-consuming components of the implant can be deactivated during the implant's storage by means of the deactivation device, and, furthermore, characterized by a device for permanent storage of the implant-specific data.

REFERENCES:
patent: 5080096 (1992-01-01), Hooper
patent: 5342408 (1994-08-01), deCoriolis et al.
patent: 5350407 (1994-09-01), McClure et al.
patent: 5370666 (1994-12-01), Lindberg et al.
patent: 5414405 (1995-05-01), Hogg
patent: 5425361 (1995-06-01), Fenzlein
patent: 5522856 (1996-06-01), Reineman
patent: 6016448 (2000-01-01), Busacker et al.
patent: 6285897 (2001-09-01), Kilcoyne
patent: 6689056 (2004-02-01), Kilcoyne et al.
patent: 197 58 393 (1999-07-01), None
patent: 0 545 242 (1992-11-01), None
patent: 0 560 470 (1993-09-01), None
patent: 2 781 905 (2000-02-01), None
patent: WO 95/16313 (1995-06-01), None
patent: WO 00/59376 (2000-10-01), None
patent: WO 01/35813 (2001-05-01), None

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