Electrical overstress protection material and process

Stock material or miscellaneous articles – Web or sheet containing structurally defined element or... – Including a second component containing structurally defined...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

428329, 428331, 428403, 428404, 174127, 252504, 252506, 252507, 252511, 252512, 252513, 252514, 252516, 252518, 252519, 252520, 338 21, 361 91, 361127, 427215, 427216, 427217, H01B 114, H01B 116, H01C 712, H01C 710

Patent

active

047269910

ABSTRACT:
A material provides protection against electrical overstress transients having rise times as rapid as a few nanoseconds or less. The material comprises a matrix formed of a mixture of separate particles of conductive materials and separate particles of semiconductor materials coated with insulating material to provide chains of the particles within the matrix with interparticle separation distances along the chains less than several hundred angstroms, thereby to permit quantum-mechanical tunneling of electrons between the separate particles in response to high energy electrical transients.

REFERENCES:
patent: 3210461 (1965-10-01), Berg et al.
patent: 4103274 (1978-07-01), Burgess et al.
patent: 4252692 (1981-02-01), Taylor et al.
patent: 4331948 (1982-05-01), Malinaric et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electrical overstress protection material and process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrical overstress protection material and process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrical overstress protection material and process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-602379

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.