Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1989-06-29
1990-11-06
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, H01J 37073
Patent
active
049688944
ABSTRACT:
An electrical field-enhanced electron image projector (10) is exposed to an electrical field source (26) to induce the emission of electrons (20) which flow across a gap (28) from a pattern (14) of mask (12) to a photoresist layer (18) of a substrate (16). A heat source (22) can be applied to increase the flow of electrons (20) from the pattern (14) to the photoresist layer (18). As the gap (28) distance decreases, the ability of electrons (20) to move from the pattern (14) to the photoresist layer (18) increases.
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Berman Jack I.
Comfort James T.
Fritz Raymond E.
Nguyen Keit T.
Sharp Melvin
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