Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Patent
1981-12-24
1983-10-18
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaged product
Including resin or synthetic polymer
430 11, 430283, 430311, 430272, 430319, 430330, 428901, G03C 500
Patent
active
044106122
ABSTRACT:
An electrical device formed from a polymeric heat resistant photopolymerizable composition of a polyamide ester, resin containing photopolymerizable groups which forms a relief structures on electrical devices such as capacitors, integrated circuits, printed circuits, multilayer circuits or semiconductors; a solution of the composition is applied to a substrate such as a coated silicon wafer, dried to form a film, the film is exposed to radiation through a pattern and photopolymerized; the unexposed and unpolymerized part of the film is dissolved off and the resulting relief structure is converted to a polyimide structure with sharp definition and has good mechanical, chemical and electrical properties; to reduce radiation exposure time and increase the rate of photopolymerization the following constituents are used in the composition: a radiation sensitive polymerizable polyfunctional acrylate compound and a photopolymerization initiator of an aromatic biimidazole.
REFERENCES:
patent: 3380831 (1968-04-01), Cohen et al.
patent: 3479185 (1969-11-01), Chambers
patent: 3552973 (1971-01-01), Fishman
patent: 3594410 (1971-07-01), Cohen et al.
patent: 3623870 (1971-11-01), Curran et al.
patent: 3784557 (1974-01-01), Cescon
patent: 3953877 (1976-04-01), Sigusch et al.
patent: 3957512 (1976-05-01), Kleeberg et al.
patent: 4040831 (1977-08-01), Rubner et al.
patent: 4093461 (1978-06-01), Loprest et al.
patent: 4117196 (1978-09-01), Mathias
patent: 4132812 (1979-01-01), Mathias
patent: 4188224 (1980-02-01), Felder et al.
Goff David L.
Proskow Stephen
Yuan Edward L.
Brammer Jack P.
E. I. Du Pont de Nemours and Company
Fricke Hilmar L.
LandOfFree
Electrical device formed from polymeric heat resistant photopoly does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrical device formed from polymeric heat resistant photopoly, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrical device formed from polymeric heat resistant photopoly will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1289934