Coating apparatus – Gas or vapor deposition – With treating means
Patent
1989-06-02
1990-04-17
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
439805, C23C 1650
Patent
active
049170449
ABSTRACT:
An electrical contact apparatus for use in a plama or glow discharge chamber, particularly a chamber for depositing silicon oxynitride. A feedthrough member provides an electrical path between the interior and exterior of the chamber. An electrical contact member having an outwardly domed surface engages the feedthrough member. A non-conductive collar is disposed about the domed surface for limiting the flow of gas around the domed surface.
REFERENCES:
patent: 4401507 (1983-08-01), Engle
patent: 4422407 (1983-12-01), Bessot et al.
Kawamoto Galen H.
Yau Leopoldo D.
Bueker Richard
Intel Corporation
Owens Terry J.
LandOfFree
Electrical contact apparatus for use with plasma or glow dischar does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrical contact apparatus for use with plasma or glow dischar, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrical contact apparatus for use with plasma or glow dischar will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1045312